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grain boundary
SEMI M9 — Specification for Polished Monocrystalline Gallium Arsenide Wafers
Procedures for preparing the specimen
line dimensions
This Test Method is applicable for carbon content between 1 × 1013 cm−3 and the solubility limit (>1 × 1016 cm−3)
P04800 - SEMI P48 - Specification of Fiducial Marks for EUV Mask Blank StdPbc-1014 grain boundaryThis Standard specifies key requirements of fiducial marks that can be used as a coordinate system for referencing defect locations on extreme ultraviolet (EUV) blanks. This Standard is intended to set an appropriate level of technical specifications of mask fiducial marks, such as their locations, shapes, sizes, line dimensions, and limits of variation. The marks must be readable by mask metrology and pattern write tools. This Standard is not
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US$ 49.95